THE GREATEST GUIDE TO NOOHAPOU

The Greatest Guide To Noohapou

The Greatest Guide To Noohapou

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The POU3500 technique delivers dynamic temperature Charge of the method chamber cathode / electrode / anode and may be synchronized with any etch system.

30% of its peak electrical power use, featuring our consumers important reduction in functioning charges and elevated dependability.

While using the POU3500, you could achieve unprecedented ends in etch functionality, chamber uptime, minimized price of ownership and fab space utilization – all though improving upon your method trustworthiness.

at first Established in 1985, our enterprise has developed into a regarded chief in furnishing temperature control units to the global semiconductor market.

LAUDA-Noah will, for your buyer's retrofit evaluation, watch and adjust its fluid temperature Handle profiles to match an present TCUs' as a way to ensure a sleek procedure integration by using DAQ.

We are guided in our belief that prosperity On this aggressive industry stems from offering prospects with remarkably engineered new solutions and environment class customer service.

All static TCUs need excess cooling & heating capacities due to their really large process fluid reservoirs. The process fuid reservoir on LAUDA-Noah's dynamic temperature Handle procedure is under 1 gallon.

With the POU3300, it is possible to attain unparalleled brings about etch overall performance, chamber uptime, minimized cost of possession and fab Area utilization – all whilst increasing your system reliability.

the info pertains into a 300mm chamber temperature profile through a significant facet ratio Etch approach, working at extremely large RF electrical power conditions (~3.8kW). The compelling facets of this information established are:

Dynamic Temperature Management, as implemented in devices similar to the LAUDA-Noah POU, is really an tactic that senses the temperature of the procedure fluid getting back from the procedure chamber’s wafer chuck (ESC) and dynamically adjusts the temperature on the supplied course of action fluid determined by this real-time suggestions.

The data established Here's from the 200mm volume creation wafer fab and clearly illustrates the good thing about the LAUDA-Noah POU system.

over ever, shrinking unit geometries, demanding new processes along with a very competitive natural environment need temperature Manage systems that Mix fast and precise temperature Handle having an emphasis on minimized working charges and improved dependability.

the truth get more info is genuine Dynamic Temperature Management can only be achieved when all 5 (5) of the following technique style and design and set up prerequisites are achieved:

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We require significantly less cooling/heating capability for the same software being a static TCU due to our compact reservoir quantity.

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